CH ENGR 236

Chemical Vapor Deposition

Chemical Engineering · 4 units · Graduate courses (200-299)

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Chemical vapor deposition is widely used to deposit thin films that comprise microelectronic devices. Topics include reactor design, transport phenomena, gas and surface chemical kinetics, structure and composition of deposited films, and relationship between process conditions and film properties.

Letter grading.

Requisites

Official UCLA wording
Requisites: courses 210, C216.

BruinTree reads · Prerequisite

confidence 1.00 · from text

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Requires

Everything that has to come before this course, not just the courses named in the requisite above.

CH ENGR 236

CH ENGR 210Advanced Chemical Reaction Engineering
- CH ENGR 101CMass Transfer
  - CH ENGR 101BTransport Phenomena II: Heat Transfer1 more beneath
- CH ENGR 106Chemical Reaction Engineering
  - CH ENGR 100Fundamentals of Chemical and Biomolecular Engineering4 more beneath
  - CH ENGR 101CMass Transferanother path to it
CH ENGR C216Surface and Interface Engineering

2 direct requisites. Showing 8 courses over 3 levels; the branches marked with a count carry on past it. Every course here opens its own tree.

Unlocks

What this course is a requisite for, and what those courses lead to in turn.

No course in the catalog lists this as a requisite.