CH ENGR 236Chemical Vapor Deposition
Chemical Engineering · 4 units · Graduate courses (200-299)
Chemical vapor deposition is widely used to deposit thin films that comprise microelectronic devices. Topics include reactor design, transport phenomena, gas and surface chemical kinetics, structure and composition of deposited films, and relationship between process conditions and film properties.
Letter grading.
When it runs
Not on the schedule for any of Fall 2025 through Spring 2027. UCLA publishes only that window, so this does not mean the course is gone — check the official listing.
Requisites
Official UCLA wording
Requisites: courses 210, C216.
BruinTree reads · Prerequisite
confidence 1.00 · from textRequires
Everything that has to come before this course, not just the courses named in the requisite above.
CH ENGR 236
- CH ENGR 210Advanced Chemical Reaction Engineering
- CH ENGR 101CMass Transfer
- CH ENGR 106Chemical Reaction Engineering
- CH ENGR C216Surface and Interface Engineering
2 direct requisites. Showing 8 courses over 3 levels; the branches marked with a count carry on past it. Every course here opens its own tree.
Unlocks
What this course is a requisite for, and what those courses lead to in turn.
No course in the catalog lists this as a requisite.