CH ENGR 234
Plasma Chemistry and Engineering
Chemical Engineering · 4 units · Graduate courses (200-299)
Designed for graduate chemistry or engineering students. Application of chemistry, physics, and engineering principles to design and operation of plasma and ion-beam reactors used in etching, deposition, oxidation, and cleaning of materials.
Examination of atomic, molecular, and ionic phenomena involved in plasma and ion-beam processing of semiconductors, etc. Letter grading.
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Requisites
UCLA lists no requisites for this course.
Requires
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